Ion Guns and Power Supplies

• Our Model HWIG-250 Ion Gun is a complete ion gun assembly. This is supplied with a Cesium (or ion other type) source pellet already installed and is designed to be mounted within a vacuum chamber or instrument. The gun is capable of producing a 10 KeV ion beam of over 1 microamp (Cs) focused to a spot size of less than 1 mm² at a distance of 2.5 cm from the exit aperture.
• Model HWIG-250F is designed to mount to a 23/4" CFF
• Model HWIG-250F can mount with optional 102659 X-Y adapter kit
• Other Ion Types can be used if used with optional #101504 adapter
• Spare Cesium sources are #101141
• Floating (PS-4) or non floating (PS-5) 15KV power supplies available

HWIG-250F, above left, and HWIG-250, above right

HWIG-250F Ion Gun Shown Without Exit Aperture/ Shield

The HeatWave Labs Model HWIG-1399 Ion Gun is ideal for use in surface chemistry experiments such as sample preparation and depth profiling with Auger and ESCA. 5keV energy @ 20µA.

15keV unit also available.

• Beam energy: 50V to 5000V, continuously variable
• Beam current: 20uAmp maximum (Argon) at 5kV beam energy.
  Less than 1nA minimum
• Spot size: 0.4mm at 20uAmp, 5kV, 25mm working distance.
  50umeter at 1uAmp, 5kV, 25mm working distance
• Working distance: 5mm to 25cm
• Raster area: 1cm sq.
• Electrical requirements: 115/220V 50/60Hz autoselect,
  (125 watts max power from wall)
• Mounting flange: 2-3/4" (70mm) Conflat
• Gas inlet: 1-1/3" (34mm) Conflat
• Differential pumping port: 2-3/4" (70mm) Conflat

• Duoplasmatron level performance from an electron impact source
• Adjustable spot size = 15µm for spatially defined sputtering
• Emission regulated bombardment provides stable ion current with front panel adjustable dynamic range x300
• Continuously variable beam energy up to 5keV
• Dual octupole for beam scanning and astigmatism correction
• Pre-objective lens deflection for reduced spot size
• Integral beam current monitoring capability
• No direct filament to sample line of sight to avoid unwanted sample contamination
• Replaceable beam trimming aperture with typical lifetime of >500 hours
• Dual filaments provide operational backup with typical filament life-time >500 hours
• Internal source pressure sensor permits monitoring of ion source pressure
• All UHV compatible and etch resistant materials used in fabrication
• Differential pumping to minimize main chamber gas loading
• Operates over the range of inert gas species
• See TB-213 for data sheet